We deliver solutions for high volume nanoimprinting on large wafers. Our solutions enable manufacturers of LEDs, lasers, optical components, solar cells, bio-sensors and many others to increase performance and lower end-product costs. Working with us gives you a one-stop-shop for all your nanoimprint process requirements. From R&D on your specific nanoimprinting needs to setting up of your high volume manufacturing, we support you throughout the value chain, to bring your ideas to market quickly and more efficiently.
Our scalable process reduces your risks from concept to volume manufacture by using compatible processes and materials. Essentially, optimal equipment design ensures optimal output with optimal cost performance. So, you can jump-start your products in the market and guarantee that your solutions will be of the highest quality.
We provide you with:
Speed up your
Our expertise combines the detailed knowledge of imprint technologies and material interactions necessary to address many different applications. This means you can speed development and manufacturing using equipment and materials from a single partner. You also have the convenience of a single point of contact for any service requirements. From test through to production, or at any stage in between, SCIL Nanoimprint Solutions is your service and support partner of choice.
SCIL stands for ‘Substrate Conformal Imprinting Lithography’, a cost effective, robust, high yield process enabling nanometer resolution on a large variety of substrates. Satisfying the rapidly increasing demand for products with nano imprinted components, SCIL delivers proven, high quality imprints on large areas up to 200 mm. It can be used to make nano and micro patterns with feature sizes down to less than 10 nm. And because of the unique properties of the imprint resist, SCIL saves time by directly producing a hard-etch mask or functional layer.
Unlike conventional lithography processes, SCIL has fewer defects Compared to other imprint lithography processes SCIL causes less damage to the materials thanks to its soft conformal stamp. Patterns are imprinted over particle contaminants and distortions are dissipated in the soft rubber layer. Improving yield, this results in lower operation cost and high quality output of your products.
The easy choice
SCIL combines the resolution and accuracy of rigid stamps with the flexibility of soft stamp methods. SCIL takes away all the drawbacks of rigid lithography, achieving nanometre resolution without the pattern deformation that other soft stamp methods suffer from. Benefits include:
SCIL is capable of printing non-digital patterns, and can imprint on 2.5D surfaces. Furthermore, surfaces maintain uniform thickness after imprinting
Single layer nano-patterning is a key process step for a multitude of applications, especially for lighting and optical systems.
Our technologies for enabling SCIL include the stamp’s top layer component of X-PDMS, which facilitates fine detail, low pressure imprinting. Low pressure and zero damage characteristics are further enhanced through a choice of patented sol-gel resists, applied by capillary action. Lastly, for large volume production the complete process is carried out by our automated lithography tool, capable of manufacturing up to 60 wafers per hour.
Nanometre resolution patterns are possible due to the tri-layer stamp construction. Our X-PDMS (polydimethylsiloxane) top layer which carries the imprint structure is added to your chosen middle and bottom layers of soft PDMS and thin glass, respectively.
In this way, the stamp achieves conformal (full wafer contact) imprinting at low pressure. It is flexible enough to follow substrate unevenness while being rigid enough to create nano structures without any deformation. The X-PDMS is also soft enough for peel removing during sequential low force stamp release.
Our special inorganic sol-gel resist material is optically transparent, and UV and temperature stable. It can be used both as hard etch mask and as a functional layer.
Ensuring low pattern deformation, the capillary force driven imprint process only uses a low pressure imprint cycle. It also ensures that the imprinting direction is always vertical. After the resist has hardened the stamp is released in a smooth peeling action.
Tool for high volume wafer manufacture Our high volume SCIL machine manufactures your wafers using an automated process
Together with our partners, we can help you turn your ideas into production-ready solutions, quickly and effectively. Our partners include many research institutes and affiliate universities for R&D. Our colleagues at Philips Innovation Services can help you turn initial concepts into reality with their pilot production facilities. And we work closely with SÜSS MicroTec, who provide a SCIL module that can be attached to a SÜSS mask aligner low volume production and testing
We want you to hit the ground running. Many research institutes and universities throughout the world have SCIL equipment and knowledge that can help you to research and develop the right process and design for your products. We will support you in finding the right research partner and will continue to support you throughout the R&D proces
For testing your new processes and systems, Philips Innovation Services can help you to produce small pilot series test runs before scaling up to volume production
We can help with all your production needs. For in-house low volume production requiring overlay alignment, we recommend to use the SÜSS MicroTec SCIL Module on their mask aligner. If you are interested in a fully automated imprint solution for in-house low and high volume production, our SCIL Nanoimprint Solutions Machine uses the same technology but can deliver the throughput and volumes you need to go to market
For any other questions, please contact us